Surface-enhanced laser desorption/ionization: Difference between revisions
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This term is used to describe the formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. See also [[DIOS|desorption/ionization on silicon]] and [[LDI|laser desorption/ionization]]. | |||
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== Related Terms == | == Related Terms == | ||
Revision as of 00:56, 28 February 2005
| DRAFT DEFINITION |
| Surface-enhanced laser desorption/ionization |
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This term is used to describe the formation of ionized species in the gas phase from analytes deposited on a particular surface substrate which is irradiated with a laser beam of which wavelength is absorbed by the surface. See also desorption/ionization on silicon and laser desorption/ionization. |
| Considered between 2004 and 2006 but not included in the 2006 PAC submission |
| This is an unofficial draft definition presented for information and comment. |
