Desorption ionization on silicon: Difference between revisions

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The formation of ions through the irradiation of a sample deposited on a porous silicon surface. See also [[laser desorption/ionization]] and [[surface-assisted laser desorption/ionization]].
The formation of ions by [[laser desorption ionization]] of a sample deposited on a porous silicon surface.
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Revision as of 23:05, 25 December 2005

DRAFT DEFINITION
Desorption ionization on silicon

The formation of ions by laser desorption ionization of a sample deposited on a porous silicon surface.

Considered between 2004 and 2006 but not included in the 2006 PAC submission
This is an unofficial draft definition presented for information and comment.

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